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THE EFFECT OF TEMPERATURE AND CHARACTERISTICS ON THE GROWTH OF SILICON DIOXIDE LAYER / NURUL HUDA ABD RASHID

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    TP245.S5
    N48 2008
     
    1030158 (Shelf),SR
    Nurul Huda Abd Rashid

         THE EFFECT OF TEMPERATURE AND CHARACTERISTICS ON THE GROWTH OF SILICON DIOXIDE LAYER.

         ix, 39 pages : illustrations (some color) ; 30 cm.
         UiTM X Digitization.
         
         1. Silica 2. Semiconductors.I. Faculty Of Applied Sciences. II. Fakulti Sains Gunaan. III. Title
         Library : UiTM Shah Alam
    Accn No.Item StatusAdd IdLocationSMDItem Category
    1030158ShelfPERPUSTAKAAN TUN ABDUL RAZAK(P1)STUDENT PROJECTpp

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