NMOS C-V characterization of gate dielectric thickness / Anees Abdul Aziz, Ahmad Sabirin Zoolfakar, Azrif Manut, Maizatul Zolkapli
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| | | | NMOS C-V characterization of gate dielectric thickness. - Shah Alam, Selangor , 2011. | ix, 72 p. : ill. ; 30 cm + 1 CD-ROM (4 3/4 in.). | | 1. Metal oxide semiconductor field-effect transistors 2. Electronic circuit design.I. Ahmad Sabirin Zoolfakar II. Azrif Manut III. Maizatul Zolkapli IV. Universiti Teknologi MARA. V. Research Management Institute. VI. Fakulti Kejuruteraan Elektrikal. VII. Faculty of Electrical Engineering. VIII. Title | | Library : UiTM Shah Alam |
| Accn No. | Item Status | Add Id | Location | SMD | Item Category | 985085 | Shelf | | PTAR REPOSITORI INSTITUSI UiTM(P1RI) | COMPACT DISC | rch | RCH740 | Shelf | | PERPUSTAKAAN TUN ABDUL RAZAK(P1) | RESEARCH REPORT | rch |
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