Hf-based high-k dielectrics : process development, performance characterization, and reliability / Young-Hee Kim, Jack C. Lee
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| | | | Hf-based high-k dielectrics : process development, performance characterization, and reliability. - [San Rafael, Calif.] , 2005. | x, 92 p. : ill. ; 24cm. | ISBN 1598290045 | .-ISBN 9781598293548. | | 1. Hafnium oxide - Junctions 2. Integrated circuits - Reliability 3. Breakdown (Electricity) 4. Dielectrics 5. Metal oxide semiconductor field-effect transistors - Reliability 6. Semiconductors - Junctions.I. Lee, Jack Chung-Yeung II. Title | | Library : UiTM Shah Alam |
| Accn No. | Item Status | Add Id | Location | SMD | Item Category | 859481 | Shelf | | PERPUSTAKAAN KEJURUTERAAN TAR(P3) | BOOK | RAK TERBUKA (OPEN SHELVES) |
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