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Hf-based high-k dielectrics : process development, performance characterization, and reliability / Young-Hee Kim, Jack C. Lee

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  • MARC

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    QC585
    .K56 2005
     
    859481 (Shelf),BOK
    Kim, Young-Hee , 1972-

         Hf-based high-k dielectrics : process development, performance characterization, and reliability. - [San Rafael, Calif.] , 2005.

         x, 92 p. : ill. ; 24cm.

         ISBN 1598290045
         .-ISBN 9781598293548.
         
         1. Hafnium oxide - Junctions 2. Integrated circuits - Reliability 3. Breakdown (Electricity) 4. Dielectrics 5. Metal oxide semiconductor field-effect transistors - Reliability 6. Semiconductors - Junctions.I. Lee, Jack Chung-Yeung II. Title
         Library : UiTM Shah Alam
    Accn No.Item StatusAdd IdLocationSMDItem Category
    859481ShelfPERPUSTAKAAN KEJURUTERAAN TAR(P3)BOOKRAK TERBUKA (OPEN SHELVES)

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